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The present invention relates to the following general formula (1), (2) and (3) represents at least one kind of group is carried out the surface-modified and surface-modified colloidal silicon dioxide containing the surface-modified colloidal silica CMP polishing compositions. According to the present invention, there is provided a CMP polishing composition for polishing in the first stage of the CMP polishing process, deterioration can be suppressed concavely curved, and no residual grinding, polishing in the second stage of the process enables the canine improved.

The present invention relates to colloidal silicon dioxide particles, and particles of organic solvent-dispersed silica sol, the polymerizable compound-dispersed silica sol and the dicarboxylic anhydride-dispersed silica sol, the colloidal silicon dioxide particles are selected from iron , aluminum, zinc, zirconium, titanium, tin, and lead at least one polyvalent metal element M in an average content of M / Si molar ratio of 0.001 to 0.02.

The present invention provides a tablet, which consists of at least 50% w / w acyclovir valine, and 0.05 Zhi 3% w / w colloidal silicon dioxide, in tablet granulations and to maintain good lubricating property but also has excellent hardness and delicate performance.



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