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Colloidal silicon dioxide is manufactured by the hydrolysis of silicon tetrachloride in a hydrogen/oxygen flame according to the following chemical reaction:

SiCl4 + 2 H2 + O2 → SiO2 + 4 HCl

Varying the process conditions results in products with different specific surface areas .The raw materials used are exclusively of inorganic origin and are very pure, resulting in products with exceptionally low heavy metal content that meets major compendial requirements.  Due to the high chemical purity of colloidal silicon dioxide feature good compatibility even with the most heavy metal sensitive active pharmaceutical ingredients. Siloxane and silanol groups are present on the surface and the silanol groups are responsible for the high affinity for water and polar compounds. Hydrophilic colloidal silicon dioxide is able to adsorb considerable quantities of water without any change in its state of aggregation. 

Single-step preparation of the dispersion surface graft methacryloyloxy trimethoxysilane (MPS) of colloidal silicon dioxide spheres, and by vertical deposition method assembled orderly preferably 40 ℃, 60% relative humidity close-packed structure of silicon dioxide photonic crystals.



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